直播时间：2025年4月11日（周五）20:00-21:30
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北京时间2025年4月11日晚八点，iCANX Talks 第222期邀请到了湖南大学教授段辉高作为主讲嘉宾，南方科技大学教授郭传飞、北京大学助理教授郑雨晴，浙江大学研究员彭博宇担任研讨嘉宾，北京大学教授张海霞担任主持人。  
这将是一场汇聚顶尖学者的盛会，共同探讨前沿科技与学术挑战！更多精彩，敬请期待！

【嘉宾介绍】

段辉高‍
湖南大学

Wafer-level Perfect Conformal Contact Photolithography towards the Diffraction Limit

【Abstract】

Lithography is a key enabling technique in modern micro/nanoscale technology. Achieving the optimal trade-off between resolution, throughput, and cost remains a central focus in the ongoing development. However, current lithographic techniques such as direct-writing, projection, and extreme ultraviolet lithography achieve higher resolution at the expense of increased complexity in optical systems, thus significantly raising the overall cost of production. Here, we present a cost-effective and efficient soft-contact photolithography method, utilizing a transferable resist to achieve wafer-level perfect conformal contact lithography at the diffraction limit. By leveraging a transferable resist, the technique ensures optimal contact between the mask and resist, facilitating the precise transfer of patterns at the diffraction limit while maintaining high fidelity and uniformity across large wafers. The proposed technique significantly expands the potential of contact photolithography for novel device architectures and manufacturing processes.

光刻是现代微/纳米技术中的关键使能技术。在分辨率、吞吐量和成本之间实现最佳权衡是光刻技术研发的重点。当前工业界常用的光刻技术，如直写光刻与投影光刻，可实现极高的分辨率，但往往以光学系统复杂性增加为代价，从而显著提高了整体生产成本。接触式光刻，在理论上也拥有光学衍射极限的分辨率且拥有极低成本优势，在实验室研发中被广泛使用，但因共形接触、对缺陷极度敏感及硬接触带来的掩模版损伤等难题，无法用于规模化生产。本报告中，我们将分享一种利用可转移的光刻胶实现完美共形接触式光刻的技术，该技术拥有近衍射极限分辨率、大面积均匀性、近零掩模版损伤等优势，使得接触式光刻在工业界应用成为了可能。

【BIOGRAPHY】

Huigao Duan is a professor of Mechanical Engineering at Hunan University and a recipient of the National Outstanding Young Scientist Fund. He received his BS and PhD in Physics from Lanzhou University in 2004 and 2010, respectively. From 2006 to 2008, he was working as a Researcher in Institute of Electrical Engineering, Chinese Academy of Sciences. From 2008 to 2012, he was a visiting student at Massachusetts Institute of Technology and then a Research Scientist in Institute of Materials Research and Engineering, A*STAR (Singapore). He was also a visiting scientist at the University of Stuttgart in 2012, hosted by Prof. Harald Giessen. He joint Hunan University as a full professor in 2012 and then setup a micro/nanofabrication laboratory there. He has co-authored more than 290 peer-reviewed journal papers with an H-index of 74. His current research interest is ultraprecision micro/nanomanufacturing and its optical applications. He has served as Editor or Associate Editor for several renowned journals such as International Journal of Extreme Manufacturing and Deputy Editor for Research (a Science Partner Journal).

段辉高，2004年及2010年获兰州大学物理学学士和博士学位，曾先后在中科院电工所、美国麻省理工学院、新加坡科技研究局材料工程研究院、德国斯图加特大学及马普固体所、英国南安普顿大学等机构从事科研工作，2012年加入湖南大学。曾获全国百优、国家优青、国家杰青等人才项目支持，在Nature Nanotechnology、Nature Energy、Light: Science & Applications等国内外期刊上发表论文290余篇，H因子为74，现担任《极端制造（英文）》，Research、《光学 精密工程》等5本期刊编委或副主编。段辉高在电子束光刻极限分辨率机理、离子束增减材协同制造工艺、大幅面高分辨完美接触式光刻技术等方面做出了系列原创性工作，为微纳光学及平面光学等器件研发提供了超精密微纳制造解决方案。