中国科学院长春光学精密机械物理研究所李文昊团队实现了大口径高精度全息衍射光栅波前像差的控制。2025年3月5日，《光：科学与应用》杂志发表了这一成果。

扫描干涉场曝光技术是一种制造米级尺寸和纳米级精度全息衍射光栅的有效方法。利用该技术制造大口径高精度光栅的主要问题是载物台的高精度位移测量、干涉条纹的高精度控制和光栅相位误差的实时补偿。

研究组分析了光栅槽误差对波前像差的影响。为了提高位移范围超过一米的载物台的精度，提出了一种结合光栅传感和激光干涉的集成位移测量方法，该方法在长位移范围内抑制了环境对测量精度的影响。他们提出了一种干涉条纹测量方法，该方法将测量光栅的衍射特性与相移算法相结合。通过控制干涉条纹的方向、周期和相位非线性误差，可以获得高质量的干涉条纹。

此外，通过使用外差干涉术实时补偿由载物台运动误差引起的光栅相位误差，建立了动态锁相模型。研究组制作了孔径为1500mm×420mm的光栅。波前像差达到0.327λ@632.8 nm，波前梯度达到16.444 nm/cm。该研究提出了一种制造米级尺寸和纳米级精度全息光栅的新技术，这将进一步促进啁啾脉冲放大系统、高能激光和超高精度位移测量的发展。

附：英文原文

Title: Controlling the wavefront aberration of a large-aperture and high-precision holographic diffraction grating

Author: Li, Wenhao, Wang, Xinyu, Bayanheshig, Liu, Zhaowu, Wang, Wei, Jiang, Shan, Li, Yubo, Li, Shuo, Zhang, Wei, Jiang, Yanxiu, Wu, Zheng, Zhou, Wenyuan

Issue&Volume: 2025-03-05

Abstract: The scanning interference field exposure technique is an effective method to fabricate holographic diffraction grating with meter-level size and nano-level precision. The main problems of fabricating large-aperture and high-precision grating by this technique are the high-precision displacement measurement of the stage, the high-precision control of the interference fringe and the real time compensation of the grating phase error. In this paper, the influence of grating groove error on the wavefront aberration is analyzed. In order to improve the precision of the stage with displacement range more than one meter, an integrated displacement measurement combining grating sensing and laser interferometry is proposed, which suppresses the influence of environment on measurement precision under long displacement range. An interference fringe measurement method is proposed, which combines the diffraction characteristics of the measuring grating with the phase-shifting algorithm. By controlling the direction, period and phase nonlinear errors of the interference fringe, high quality interference fringe can be obtained. Further, a dynamic phase-locking model is established by using heterodyne interferometry to compensate grating phase error caused by stage motion error in real time. A grating with the aperture of 1500mm×420mm is fabricated. The wavefront aberration reaches 0.327λ @ 632.8nm and the wavefront gradient reaches 16.444nm/cm. This research presents a novel technique for the fabrication of meter-level size and nano-level precision holographic grating, which would further promote the development of chirped pulse amplification systems, high-energy laser and ultra-high precision displacement measurement.

DOI: 10.1038/s41377-025-01785-2

Source: https://www.nature.com/articles/s41377-025-01785-2